A research centre in the Belgian Leuven, evaluates techniques for processors to produce a technique in which replacement metal gate . That technique would play a large role in the shrinking of transistors.
According to the Leuven-based research firm Imec would the replacement metal gate or rmg technique is an important part in the development of transistors with dimensions of less than twenty nanometers. The technique would be Intel’s hkmg – or high-k metal gate technology should follow. At Intel’s hkmg technology is the metal gate already, as the last formed, but other manufacturers, such as GlobalFoundries, adjust a gate first process. The research is together with Intel, GlobalFoundries and TSMC performed.
The rmg technique that Imec explores, is also a gate last technique, which is generally more complex than gate-first techniques. Nevertheless, it would rmg technology for future generations of processors are needed and a wide range of diëlektrummateriaal. The rmg technique owes its name to the dummy gate or temporal gate in the final production stage of the transistors is replaced by a metal gate. The material of the gate would be under lower temperature conditions could be attached to what for the gate to more material options leads.
