The Japanese memory manufacturer Elpida has, in his own words as the first producer in the world, high-K metal gate technology used for its mobile ddr2 memory. That should lead to more efficient memory for mobile applications.
Elpida has the hkmg technique for low power ddr2 modules. That memory is based on a relatively sharply 4x nanometer process, manufactured. In the future, the Japanese manufacturer of the hkmg process, also for memory with smaller featuresizes bets; a forecast when this is to be done gave the company however, did not. Have made it known even this fiscal year, have until april 2012 runs, samples to to provide.
For the lpddr2-memory managed Elpida in it for the hkmg bet required high temperatures sufficient to reduce to be compatible with the geheugenproductie. That has led to an effective decrease of thirty percent of the insulation layer of the gates. The current through the transistors may include a 1.7 times higher, while the power in a disabled state, only a hundredth of that in a silica-diëlectrum.
The hkmg technology is mainly known from the processorindustrie. The high k material is an insulator with high dielectric constant and should, inter alia, lower leakage currents result. The material is in a thin layer, on the gate of a transistor is applied. The metal gate-hkmg-technology refers to the metal electrodes used.